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極端紫外光リソグラフイ用薄膜の最適設計と分光エリプソメトリによるその評価法の研究
極端紫外光リソグラフイ用薄膜の最適設計と分光エリプソメトリによるその評価法の研究
Paper
図書
山口, 十六夫, 静岡大学
1997-1999
<Y151-H09650048>
National Diet Library
Subject Heading
極端紫外光リソグラフイ 超解像マスク 単層ハーフトーン位相シフトマスク
a-SiNX
分光エリプソメトリ 堆積過程モニタリング 基板温度監視 R...
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