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High rate ECR etching of III-V nitride materials SAND-94-3244C DE95 013032 CONF-9505186

High rate ECR etching of III-V nitride materials SAND-94-3244C DE95 013032 CONF-9505186
Microform規格・テクニカルリポート類
Shul, R. J, Howard, A. J, Kilcoyne, S. P, Pearton, S. J, Abernathy, C. R1994<LS-DE95/013032>
National Diet Library

HIGH RATE ECR ETCHING OF III-V NITRIDE MATERIALS (SAND ; SAND-94-3244C)

HIGH RATE ECR ETCHING OF III-V NITRIDE MATERIALS (SAND ; SAND-94-3244C)
Paper図書
SHUL, R.J.// HOWARD, A.J.// KILCOYNE, S.P.// PEARTON, S.J.// ABERNATHY, C.R.// VARTULI, C.B.// BARNES, P.A.// BOZACK, M.J. (SANDIA NATIONAL LABS., ALBUQUERQUE, NM (UNITED STATES))Sandia National Laboratories(Sandia National Laboratories)1994.
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