Effects of Ar Dilution and Exciting Frequency on Absolute Density and Translational Temperature of Si Atom in Very High Frequency-Capacitively Coupled SiH4 Plasmas

• 資料種別: 記事
• タイトル: Effects of Ar Dilution and Exciting Frequency on Absolute Density and Translational Temperature of Si Atom in Very High Frequency-Capacitively Coupled SiH4 Plasmas
• 巻次・部編番号: 43; 1A/B
• 著者・編者: Ohta Takayuki; Ishida Tetsuro; Hori Masaru; Goto Toshio; Ito Masafumi; Kawakami Satoru
• 著者標目: Ohta Takayuki; Ishida Tetsuro; Hori Masaru; Goto Toshio; Ito Masafumi; Kawakami Satoru
• 出版年月日等: 2004
• 出版年（W3CDTF）: 2004
• タイトル（掲載誌）: Japanese Journal of Applied Physics
• 巻号年月日等（掲載誌）: 43 1A/B
• 掲載巻: 43
• 掲載号: 1A/B
• 掲載ページ: L94-L96
• ISSN（掲載誌）: 0021-4922; 1347-4065
• 件名標目: very high frequency capacitively coupled plasma; translational temperature; UVAS; Si
• 対象利用者: 一般
• DOI: 10.1143/JJAP.43.L94
• オンライン閲覧公開範囲: インターネット公開
• 連携機関・データベース: 科学技術振興機構 : J-STAGE; http://www.jstage.jst.go.jp

• 要約等: The behaviors of translational temperatures and absolute densities of Si atoms in very high frequency (VHF)-capacitively coupled SiH<SUB>4</SUB> plasm...