New Development of Ultrahigh-Vacuum Oriented-Molecular-Beam Machine and Its Application to Chemical Reactions on Silicon Surface

• 資料種別: 記事
• タイトル: New Development of Ultrahigh-Vacuum Oriented-Molecular-Beam Machine and Its Application to Chemical Reactions on Silicon Surface
• 巻次・部編番号: 44; 12
• 著者・編者: Okada Michio; Moritani Kousuke; Goto Seishiro; Kasai Toshio
• 著者標目: Okada Michio; Moritani Kousuke; Goto Seishiro; Kasai Toshio
• 出版年月日等: 2005
• 出版年（W3CDTF）: 2005
• タイトル（掲載誌）: Japanese Journal of Applied Physics
• 巻号年月日等（掲載誌）: 44 12
• 掲載巻: 44
• 掲載号: 12
• 掲載ページ: 8580-8589
• ISSN（掲載誌）: 0021-4922; 1347-4065
• 件名標目: silicon; methylchloride; dissociative adsorption; oriented molecular beam; steric effect
• 対象利用者: 一般
• DOI: 10.1143/JJAP.44.8580
• オンライン閲覧公開範囲: インターネット公開
• 連携機関・データベース: 科学技術振興機構 : J-STAGE

• 要約等: The stereochemical control of surface reactions is one of the ultimate goals of surface scientists. An oriented-molecular-beam technique based on the ...