並列タイトル等カーボン ナノ チューブ タンシン ヲ モチイタ コウ アスペクト ヒ ナノ スケール アナ カコウホウ ノ カイハツ
Development of Fabricating Method of Nanoscale Pit with High Aspect Ratio Using Carbon Nanotube Probe
タイトル（掲載誌）総合技術研究所研究報告=Bulletin of Research Institute for Industrial Technology.
一般注記Fabrication of a high aspect ratio nanoelectromechanical systems (NEMs) and nanodevices is an indispensable challenge as microelectromechanical systems shrink towards the nanoscale. Here, we focus our attention on a fabrication technique that makes use of the scanning tunneling microscope. Additionally, we tried to establish a fabricating method for a nanoscale pit with a high aspect ratio by using carbon nanotube (CNT) as the probe. The nanostructures produced were Au thin films on mica substrates that were prepared by magnetron sputtering. The results of our experiment show that a threshold value exists for the fabrication of the pits between 1V and 2V. The depth and diameter of the pit increased with the increase in the bias voltage and tunnel current, respectively. Consequently, a b ias voltage of 3V and tunnel current of 4 nA were found to be the optimum conditions for a high aspect ratio nanoscale pit fabrication up to 4.5. In changing the fabricating time, depth of the pit increased with the increase in fabricating time, with a little change in the diameter of the pit. This demonstrates that CNT probes can be useful for fabricating structures without changing the diameter of nanoscale CNT probe.
identifier:http://repository.aitech.ac.jp/dspace/handle/11133/1705
一次資料へのリンクURLhttp://repository.aitech.ac.jp/dspace/bitstream/11133/1705/1/%e7%b7%8f%e7%a0%9411%e5%8f%b7%28P75-80%29.pdf
連携機関・データベース国立情報学研究所 : 学術機関リポジトリデータベース（IRDB）（機関リポジトリ）