カーボンナノチューブ探針を用いた高アスペクト比ナノスケール穴加工法の開発

Material type: 文書・図像類

Author: 松室, 昭仁ほか

Publisher: 愛知工業大学

Publication date: 2009-09-24

Material Format: Digital

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Note (General)：: Fabrication of a high aspect ratio nanoelectromechanical systems (NEMs) and nanodevices is an indispensable challenge as microelectromechanical system...

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Material Type: 文書・図像類
Title: カーボンナノチューブ探針を用いた高アスペクト比ナノスケール穴加工法の開発
Author/Editor: 松室, 昭仁
高木, 誠
Author Heading: 松室, 昭仁
高木, 誠
Publication, Distribution, etc.: 愛知工業大学
Publication Date: 2009-09-24
Publication Date (W3CDTF): 2009-09-24
Alternative Title: カーボン　ナノ　チューブ　タンシン　ヲ　モチイタ　コウ　アスペクト　ヒ　ナノ　スケール　アナ　カコウホウ　ノ　カイハツ
Development of　Fabricating Method of　Nanoscale Pit with High　Aspect　Ratio Using Carbon Nanotube Probe
Periodical title: 総合技術研究所研究報告=Bulletin of Research Institute for Industrial Technology.
No. or year of volume/issue: 11
Volume: 11
Pages: 75-80
ISSN (Periodical Title): ISSN : 1344-9672
Text Language Code: jpn
Target Audience: 一般
Note (General): Fabrication of a high aspect ratio nanoelectromechanical systems (NEMs) and nanodevices is an indispensable challenge as microelectromechanical systems shrink towards the nanoscale. Here, we focus our attention on a fabrication technique that makes use of the scanning tunneling microscope. Additionally, we tried to establish a fabricating method for a nanoscale pit with a high aspect ratio by using carbon nanotube (CNT) as the probe. The nanostructures produced were Au thin films on mica substrates that were prepared by magnetron sputtering. The results of our experiment show that a threshold value exists for the fabrication of the pits between 1V and 2V. The depth and diameter of the pit increased with the increase in the bias voltage and tunnel current, respectively. Consequently, a b ias voltage of 3V and tunnel current of 4 nA were found to be the optimum conditions for a high aspect ratio nanoscale pit fabrication up to 4.5. In changing the fabricating time, depth of the pit increased with the increase in fabricating time, with a little change in the diameter of the pit. This demonstrates that CNT probes can be useful for fabricating structures without changing the diameter of nanoscale CNT probe.
identifier:http://repository.aitech.ac.jp/dspace/handle/11133/1705
Format (IMT): application/pdf
Source: http://repository.aitech.ac.jp/dspace/bitstream/11133/1705/1/%e7%b7%8f%e7%a0%9411%e5%8f%b7%28P75-80%29.pdf
http://repository.aitech.ac.jp/dspace/bitstream/11133/1705/1/%e7%b7%8f%e7%a0%9411%e5%8f%b7%28P75-80%29.pdf
Access Restrictions: 限定公開
Data Provider (Database): 国立情報学研究所 : 学術機関リポジトリデータベース（IRDB）（機関リポジトリ）
https://irdb.nii.ac.jp
Original Data Provider (Database): 愛知工業大学 : 愛知工業大学学術情報リポジトリ