Journal of photopolymer science and technology

• 資料種別: 雑誌
• タイトル: Journal of photopolymer science and technology
• 巻次・部編番号: 19(1)-19(6):2006
• 著者標目: フォトポリマー学会 フォトポリマー ガッカイ ( 001142273 )典拠; Conference of Photopolymer Science and Technology ( 01236612 )典拠; フォトポリマー懇話会 フォトポリマー コンワカイ ( 00283295 )典拠
• 出版事項: Chiba : The Society of Photopolymer Science and Technology
• 出版年月日等: 2006
• 出版年（W3CDTF）: 2006
• 出版表示等に関する注記: Place of publication varies; Publisher: Technical Association of Photopolymers, Japan (v. 6, no. 1-v. 23, no. 6); The Conference of Photopolymer Science and Technology (v. 24, no. 1-v. 25, no. 6)
• 刊行巻次・年月次: v. 6, no. 1 (1993)-
• 大きさ: 29cm
• ISSN（掲載誌）: 0914-9244
• ISSN-L（掲載誌）: 0914-9244
• 出版地（国名コード）: JP
• 本文の言語コード: eng
• NDLC: ZP48
• 一般注記: Description based on the latest issue; Frequency varies
• 所蔵機関: 国立国会図書館
• 請求記号: Z53-W515
• 関連情報: 区分換 : Journal of photopolymer science and technology / フォトポリマー懇話会 編; https://ndlsearch.ndl.go.jp/books/R100000002-I000000065969
• 連携機関・データベース: 国立国会図書館 : 国立国会図書館蔵書; https://ndlsearch.ndl.go.jp
• 書誌ID（NDLBibID）: 000000156586; http://id.ndl.go.jp/bib/000000156586
• 目録規則: 国立国会図書館逐次刊行物目録規則

目次

Bilayer Resists for 193 nm Lithography: SSQ and POSS

Improved Lithographic Performance with Ultra-thin 193 nm Resist

Design and Development of ArF Photoresist for XTC Lithography Process

Material Issues in Real Device Application of Multi-function Hard Mask Process

Effect of Amine Additives on LWR and LER as Studied by Extraction Parameters

Defining the Biology-Materials Interface using both 2D and 3D Lithography

Microfabrication of Functional Polymer Gels and Their Application to Novel Biomimetic Materials

Novel Photo-Reactive Acrylamide-Based Copolymers Instantly Gave the Sensitive Stimuli-Responsive Hydrogels

Construction of Spheroid Cell Microarray on Patterned PEG Hydrogel Surface

Au Nano-Wiring on Si Wafer with NaAuCl4-Ethanol Solution

Fundamental Properties of Fluoroalcohol-Methacrylate Polymers for use in l93nm Lithography

Development of Novel Materials for 193nm Dry and Immersion Lithography

Novel Top-coat Materials Containing a Bulky Silicon Group for ArF Immersion Lithography

Advances in Immersion Related Defectivity on XT:1250i at IMEC

Materials and Process Parameters on ArF Immersion Defectivity Study

The Photopolymer Science and Tecnology Award--Mireille Maenhoudt, Geert Vandenberghe, Monique Ercken, Shaunee Cheng, Peter Leunissen and Kurt Ronse

Changes of Electron Donation by Substituents for SN Ylides obtained by Ab initio Calculations

Ultrafast Optical Responses of Doubly N-Confused Hexaphyrin Derivatives with Femtosecond Laser Excitation

Excitation Emission Matrix of Spin-coated Polymeric Thin Films and its Application to Polarized Fluorescence

Synthesis and Properties of Photoresponsive Liquid Crystalline Conjugated Polymers

PEG-based Surface Modification on Upconversion Nanophosphors for Bio-imaging under IR Excitation

Surface Relief Formation with Molecular Orientation in Photoreactive Liquid Crystalline Polymer Film

Realization of Vertical Alignment with Low Pretilt Angle by Polymer-Stabilize Technique

Polymer-Stabilized Ferroelectric Liquid Crystals Photocured under the Application of a Bipolar AC Electric Field

Development of Low-Retardation TAC Films for Protection Films of LCD's Polarizer

Improvement in Mechanical Properties of Sn-doped Indium Oxide Layer on Plastic Substrates

Preparation and Characterization of Free Radical Photopolymer with Carbon Black Nano-particle

Design and Characteristics of Acrylate Polymers with Alicyclic Lactone Group for ArF resists

Thermolysis of Polymethacrylates for 193 nm Resist

Photocrosslinking of Oligomers Bearing Glycidyl Sulfonate Ester Units and Their Redissolution Property