Journal of photopolymer science and technology

• Material Type: 雑誌
• ISSN: 0914-9244
• ISSN-L: 0914-9244
• Title: Journal of photopolymer science and technology
• Volume: 19(1)-19(6):2006
• Author Heading: フォトポリマー学会 フォトポリマー ガッカイ ( 001142273 )Authorities; Conference of Photopolymer Science and Technology ( 01236612 )Authorities; フォトポリマー懇話会 フォトポリマー コンワカイ ( 00283295 )Authorities
• Publication, Distribution, etc.: Chiba : The Society of Photopolymer Science and Technology
• Publication Date: 2006
• Publication Date (W3CDTF): 2006
• Note (Publication, distribution, etc.): Place of publication varies; Publisher: Technical Association of Photopolymers, Japan (v. 6, no. 1-v. 23, no. 6); The Conference of Photopolymer Science and Technology (v. 24, no. 1-v. 25, no. 6)
• Year and volume of publication: v. 6, no. 1 (1993)-
• Size: 29cm
• Place of Publication (Country Code): JP
• Text Language Code: eng
• NDLC: ZP48
• Note (General): Description based on the latest issue; Frequency varies
• Holding library: 国立国会図書館
• Call No.: Z53-W515
• Related Material: 区分換; https://ndlsearch.ndl.go.jp/books/R100000002-I000000065969
• Data Provider (Database): 国立国会図書館 : 国立国会図書館蔵書; https://ndlsearch.ndl.go.jp
• Bibliographic ID (NDL): 000000156586; http://id.ndl.go.jp/bib/000000156586
• National Bibliography No. (JPNO): 10050993
• Cataloging Rule: National Diet Library Cataloging Rules for Serials
• Bibliographic Record Category (NDL): 132

Table of Contents

Defining the Biology-Materials Interface using both 2D and 3D Lithography

Microfabrication of Functional Polymer Gels and Their Application to Novel Biomimetic Materials

Novel Photo-Reactive Acrylamide-Based Copolymers Instantly Gave the Sensitive Stimuli-Responsive Hydrogels

Construction of Spheroid Cell Microarray on Patterned PEG Hydrogel Surface

Au Nano-Wiring on Si Wafer with NaAuCl4-Ethanol Solution

The Photopolymer Science and Tecnology Award--Mireille Maenhoudt, Geert Vandenberghe, Monique Ercken, Shaunee Cheng, Peter Leunissen and Kurt Ronse

Changes of Electron Donation by Substituents for SN Ylides obtained by Ab initio Calculations

Ultrafast Optical Responses of Doubly N-Confused Hexaphyrin Derivatives with Femtosecond Laser Excitation

Excitation Emission Matrix of Spin-coated Polymeric Thin Films and its Application to Polarized Fluorescence

Synthesis and Properties of Photoresponsive Liquid Crystalline Conjugated Polymers

Fundamental Properties of Fluoroalcohol-Methacrylate Polymers for use in l93nm Lithography

Development of Novel Materials for 193nm Dry and Immersion Lithography

Novel Top-coat Materials Containing a Bulky Silicon Group for ArF Immersion Lithography

Advances in Immersion Related Defectivity on XT:1250i at IMEC

Materials and Process Parameters on ArF Immersion Defectivity Study

Bilayer Resists for 193 nm Lithography: SSQ and POSS

Improved Lithographic Performance with Ultra-thin 193 nm Resist

Design and Development of ArF Photoresist for XTC Lithography Process

Material Issues in Real Device Application of Multi-function Hard Mask Process

Effect of Amine Additives on LWR and LER as Studied by Extraction Parameters

Improvement in Mechanical Properties of Sn-doped Indium Oxide Layer on Plastic Substrates

Preparation and Characterization of Free Radical Photopolymer with Carbon Black Nano-particle

Design and Characteristics of Acrylate Polymers with Alicyclic Lactone Group for ArF resists

Thermolysis of Polymethacrylates for 193 nm Resist

Photocrosslinking of Oligomers Bearing Glycidyl Sulfonate Ester Units and Their Redissolution Property

PEG-based Surface Modification on Upconversion Nanophosphors for Bio-imaging under IR Excitation

Surface Relief Formation with Molecular Orientation in Photoreactive Liquid Crystalline Polymer Film

Realization of Vertical Alignment with Low Pretilt Angle by Polymer-Stabilize Technique

Polymer-Stabilized Ferroelectric Liquid Crystals Photocured under the Application of a Bipolar AC Electric Field

Development of Low-Retardation TAC Films for Protection Films of LCD's Polarizer