Submicron lithography / Phillip D. Blais, chairman/editor ; in cooperation with the International Society for Hybrid Microelectronics, the Northern California Microphotomask/Masking Working Group, the Materials Research Society, March 29-30, 1982, Santa Clara, California.

• 資料種別: 図書
• ISBN: 0892523689 (pbk.)
• タイトル: Submicron lithography / Phillip D. Blais, chairman/editor ; in cooperation with the International Society for Hybrid Microelectronics, the Northern California Microphotomask/Masking Working Group, the Materials Research Society, March 29-30, 1982, Santa Clara, California.
• シリーズタイトル: Proceedings of SPIE--the International Society for Optical Engineering ; v. 333
• 著者標目: Blais, Phillip D.; International Society for Hybrid Microelectronics.; Northern California Microphotomask/Masking Working Group.; Materials Research Society.
• 出版事項: Bellingham, Wash. : International Society for Optical Engineering
• 出版年月日等: 1982.
• 出版年（W3CDTF）: 1982
• 数量: viii, 179 p. : ill. ; 28 cm.
• 出版地（国名コード）: US
• 本文の言語コード: eng
• 件名標目: Photoresists -- Congresses.; Photolithography -- Congresses.
• LCC: TK7874
• DDC: 621.381/74
• NDLC: M15; ND
• 書誌注記: Includes bibliographical references and indexes.
• 所蔵機関: 国立国会図書館
• 請求記号: M15-A5689
• 連携機関・データベース: 国立国会図書館 : 国立国会図書館蔵書; https://ndlsearch.ndl.go.jp
• 書誌ID（NDLBibID）: 000003097495; http://id.ndl.go.jp/bib/000003097495
• LC control number: 82060280; https://lccn.loc.gov/82060280
• 整理区分コード: 211