Electron-beam, X-ray, and ion-beam techniques for submicrometer lithographies IV : March 14-15, 1985, Santa Clara, California / Phillip D. Blais, chairman/editor ; cooperating organization, the International Society for Hybrid Microelectronics.

• 資料種別: 図書
• ISBN: 089252572X (pbk.)
• タイトル: Electron-beam, X-ray, and ion-beam techniques for submicrometer lithographies IV : March 14-15, 1985, Santa Clara, California / Phillip D. Blais, chairman/editor ; cooperating organization, the International Society for Hybrid Microelectronics.
• シリーズタイトル: Proceedings of SPIE--the International Society for Optical Engineering ; v. 537
• 著者標目: Blais, Phillip D.; International Society for Hybrid Microelectronics.
• 出版事項: Bellingham, Wash., USA : SPIE--the International Society for Optical Engineering
• 出版年月日等: c1985.
• 出版年（W3CDTF）: 1985
• 数量: vi, 219 p. : ill. ; 28 cm.
• 出版地（国名コード）: US
• 本文の言語コード: eng
• 件名標目: Lithography, Electron beam -- Congresses.; X-ray lithography -- Congresses.; Ion beam lithography -- Congresses.
• LCC: TK7874
• DDC: 621.3815/2
• NDLC: M15; ND
• 書誌注記: Includes bibliographies and index.
• 所蔵機関: 国立国会図書館
• 請求記号: M15-A1319
• 連携機関・データベース: 国立国会図書館 : 国立国会図書館蔵書; https://ndlsearch.ndl.go.jp
• 書誌ID（NDLBibID）: 000003126298; http://id.ndl.go.jp/bib/000003126298
• LC control number: 85061233; https://lccn.loc.gov/85061233
• 整理区分コード: 211