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Electron-beam, X-ray, and ion-beam techniques for submicrometer lithographies IV : March 14-15, 1985, Santa Clara, California / Phillip D. Blais, chairman/editor ; cooperating organization, the International Society for Hybrid Microelectronics. (Proceedings of SPIE--the International Society for Optical Engineering ; v. 537)

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Electron-beam, X-ray, and ion-beam techniques for submicrometer lithographies IV : March 14-15, 1985, Santa Clara, California / Phillip D. Blais, chairman/editor ; cooperating organization, the International Society for Hybrid Microelectronics.

(Proceedings of SPIE--the International Society for Optical Engineering ; v. 537)

Call No. (NDL)
M15-A1319
Bibliographic ID of National Diet Library
000003126298
Material type
図書
Author
Blais, Phillip D.ほか
Publisher
SPIE--the International Society for Optical Engineering
Publication date
c1985.
Material Format
Paper
Capacity, size, etc.
vi, 219 p. : ill. ; 28 cm.
NDC
-
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Paper

Material Type
図書
ISBN
089252572X (pbk.)
Title
Electron-beam, X-ray, and ion-beam techniques for submicrometer lithographies IV : March 14-15, 1985, Santa Clara, California / Phillip D. Blais, chairman/editor ; cooperating organization, the International Society for Hybrid Microelectronics.
Series Title
Proceedings of SPIE--the International Society for Optical Engineering ; v. 537
Author Heading
Blais, Phillip D.
International Society for Hybrid Microelectronics.
Publication, Distribution, etc.
Bellingham, Wash., USA : SPIE--the International Society for Optical Engineering
Publication Date
c1985.
Publication Date (W3CDTF)
1985
Extent
vi, 219 p. : ill. ; 28 cm.
Place of Publication (Country Code)
US