Plasma process-induced damage : 4th International symposium : May 1999, Monterey, CA.

• 資料種別: 図書
• ISBN: 0965157733 (pbk); 0780351894 (microfiche)
• タイトル: Plasma process-induced damage : 4th International symposium : May 1999, Monterey, CA.
• 著者標目: Institute of Electrical and Electronics Engineers. Electron Devices Society.; American Vacuum Society.; Japan Society of Applied Physics.
• 出版事項: American Vacuum Society
• 出版年月日等: 1999.
• 出版年（W3CDTF）: 1999
• 数量: v.
• 並列タイトル等: Also known as 4th P2ID. IEEE cat no 99TH8395; P2ID ; plasma process induced damage ; IEEE ; JSAP
• NDLC: M17; ND
• 一般注記: Extended abstracts.; Also known as 4th P2ID. IEEE cat no 99TH8395.; Index term: P2ID ; plasma process induced damage ; IEEE ; JSAP.; BL shelfmark: 4550.30255 4th 1999.
• 所蔵機関: 国立国会図書館
• 請求記号: M17-00-0557
• 連携機関・データベース: 国立国会図書館 : 国立国会図書館蔵書; https://ndlsearch.ndl.go.jp
• 書誌ID（NDLBibID）: 000003510362; http://id.ndl.go.jp/bib/000003510362
• UKMARC番号: G05900623
• 整理区分コード: 215