Plasma process-induced damage : 4th International symposium : May 1999, Monterey, CA.

Author: Institute of Electrical and Electronics Engineers. Electron Devices Society.ほか

Notes on use

Note (General)：: Extended abstracts.Also known as 4th P2ID. IEEE cat no 99TH8395.Index term: P2ID ; plasma process induced damage ; IEEE ; JSAP....

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Material Type: 図書
ISBN: 0965157733 (pbk)
0780351894 (microfiche)
Title: Plasma process-induced damage : 4th International symposium : May 1999, Monterey, CA.
Author Heading: Institute of Electrical and Electronics Engineers. Electron Devices Society.
American Vacuum Society.
Japan Society of Applied Physics.
Publication, Distribution, etc.: American Vacuum Society
Publication Date: 1999.
Publication Date (W3CDTF): 1999
Extent: v.
Alternative Title: Also known as 4th P2ID. IEEE cat no 99TH8395
P2ID ; plasma process induced damage ; IEEE ; JSAP
NDLC: M17
ND
Note (General): Extended abstracts.
Also known as 4th P2ID. IEEE cat no 99TH8395.
Index term: P2ID ; plasma process induced damage ; IEEE ; JSAP.
BL shelfmark: 4550.30255 4th 1999.
Holding library: 国立国会図書館
Call No.: M17-00-0557
Data Provider (Database): 国立国会図書館 : 国立国会図書館蔵書
https://ndlsearch.ndl.go.jp
Bibliographic ID (NDL): 000003510362
http://id.ndl.go.jp/bib/000003510362
UKMARC No.: G05900623
Bibliographic Record Category (NDL): 215