Physics and technology of high-k gate dielectrics 1 : proceedings of the international symposium on high dielectric constant materials: materials science, processing, reliability, and manufacturing issues : held in Salt Lake City, Utah, October 20-24, 2002. : 1st international symposium on high dielectric constant materials: materials science, processing, reliability, and manufacturing issues : Oct 2002, Salt Lake City, UT. (PV ; 2002-28)
Physics and technology of high-k gate dielectrics 1 : proceedings of the international symposium on high dielectric constant materials: materials science, processing, reliability, and manufacturing issues : held in Salt Lake City, Utah, October 20-24, 2002. : 1st international symposium on high dielectric constant materials: materials science, processing, reliability, and manufacturing issues : Oct 2002, Salt Lake City, UT.
Selected papers."This volume is the proceedings of The First International Symposium on High Dielectric Constant Materials: Materials Science, Process...
"This volume is the proceedings of The First International Symposium on High Dielectric Constant Materials: Materials Science, Processing, Reliability, and Manufacturing Issues, (...) and was held during its 202nd Meeting." -- p. v.