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Physics and technology of high-k gate dielectrics 1 : proceedings of the international symposium on high dielectric constant materials: materials science, processing, reliability, and manufacturing issues : held in Salt Lake City, Utah, October 20-24, 2002. : 1st international symposium on high dielectric constant materials: materials science, processing, reliability, and manufacturing issues : Oct 2002, Salt Lake City, UT. (PV ; 2002-28)

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Physics and technology of high-k gate dielectrics 1 : proceedings of the international symposium on high dielectric constant materials: materials science, processing, reliability, and manufacturing issues : held in Salt Lake City, Utah, October 20-24, 2002. : 1st international symposium on high dielectric constant materials: materials science, processing, reliability, and manufacturing issues : Oct 2002, Salt Lake City, UT.

(PV ; 2002-28)

Call No. (NDL)
M17-04-3239
Bibliographic ID of National Diet Library
000007484181
Material type
図書
Author
Kar, S.ほか
Publisher
Electrochemical Society
Publication date
c2003.
Material Format
Paper
Capacity, size, etc.
xvii, 304 p. : ill. ; 24 cm.
NDC
-
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Selected papers."This volume is the proceedings of The First International Symposium on High Dielectric Constant Materials: Materials Science, Process...

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Paper

Material Type
図書
ISBN
1566773954
Series Title
Publication, Distribution, etc.
Publication Date
c2003.
Publication Date (W3CDTF)
2003
Extent
xvii, 304 p. : ill. ; 24 cm.