Advances in resist materials and processing technology 24 : 26-28 February 2007 : San Jose, California, USA. : SPIE conference on advances in resist materials and processing technology 24 : international symposium on advanced lithography : Feb 2007, San Jose, CA. (SPIE Proceedings ; 6519)
Advances in resist materials and processing technology 24 : 26-28 February 2007 : San Jose, California, USA. : SPIE conference on advances in resist materials and processing technology 24 : international symposium on advanced lithography : Feb 2007, San Jose, CA.
Papers."The Resist Conference also hosted a well-attended joint session on Resists for Extreme UV Lithography with the Emerging Lithography Conference...
"The Resist Conference also hosted a well-attended joint session on Resists for Extreme UV Lithography with the Emerging Lithography Conference." -- introd.
" (...) to make their annual pilgrimage to the SPIE Resist Conference year after year." -- introd.
書誌注記
Includes bibliographical references and author index.