Photomask technology 2012 : 11-13 September 2012 : Monterey, California, United States : SPIE conference on photomask technology 2012 : 32nd international symposium on photomask technology : Sep 2012, Monterey, CA.
An abstract and papers.Described as "The conference was (...) held as part of the 32nd International Symposium on Photomask Technology 10-13 September...
Described as "The conference was (...) held as part of the 32nd International Symposium on Photomask Technology 10-13 September 2012 in Monterey, (...)" -- introd.
書誌注記
Includes bibliographical references and author index.