Photomask technology 2012 : 11-13 September 2012 : Monterey, California, United States.

• Material Type: 図書
• ISBN: 9780819492609 (paperback)
• ISSN (series): 0277786X
• Title: Photomask technology 2012 : 11-13 September 2012 : Monterey, California, United States.
• Series Title: SPIE Proceedings ; 8522
• Author Heading: Abboud, Frank E.; Faure, Thomas B.
• Publication, Distribution, etc.: Bellingham : SPIE
• Publication Date: c2012.
• Publication Date (W3CDTF): 2012
• Extent: 1 v. (various pagings)
• Other physical details: ill.
• Size: 28 cm.
• Additional Title: SPIE conference on photomask technology 2012 : 32nd international symposium on photomask technology : Sep 2012, Monterey, CA.
• Place of Publication (Country Code): US
• Text Language Code: eng
• Subject Heading: Integrated circuits--Masks--Congresses.; Masks (Electronics)--Congresses.; Microlithography--Congresses.
• NDLC: M17
• Target Audience: 一般
• Note (General): An abstract and papers.; Described as "The conference was (...) held as part of the 32nd International Symposium on Photomask Technology 10-13 September 2012 in Monterey, (...)" -- introd.
• Note (Bibliography): Includes bibliographical references and author index.
• Holding library: 国立国会図書館
• Call No.: M17-13-1687
• Data Provider (Database): 国立国会図書館 : 国立国会図書館蔵書; https://ndlsearch.ndl.go.jp
• Bibliographic ID (NDL): 024187763; http://id.ndl.go.jp/bib/024187763
• LC Control Number: 2012540918; https://lccn.loc.gov/2012540918
• Cataloging Rule: Anglo-American Cataloging Rules
• Bibliographic Record Category (NDL): 215