並列タイトル等Metrology, inspection, and process control for microlithography 29 : 23-26 February 2015 : San Jose, California, United States
SPIE. advanced lithography
資料の内容に関する注記'Proceedings of SPIE' presents the original research papers presented at SPIE conferences and other high-quality conferences in the broad-ranging fields of optics and photonics. These books provide prompt access to the latest innovations in research and technology in their respective fields.
書誌注記Includes bibliographical references and author index.