Metrology, inspection, and process control for microlithography XXIX : 23-26 February 2015 : San Jose, California, United States : 29th conference on metrology, inspection, and process control for microlithography : advanced lithography symposium : Feb 2015, San Jose, CA.

• Material Type: 図書
• ISBN: 1628415266
• ISBN (set): 9781628415261 (set)
• ISSN (series): 0277-786X
• Title: Metrology, inspection, and process control for microlithography XXIX : 23-26 February 2015 : San Jose, California, United States : 29th conference on metrology, inspection, and process control for microlithography : advanced lithography symposium : Feb 2015, San Jose, CA.
• Series Title: SPIE Proceedings ; 9424
• Title Heading: Proceedings of SPIE--the International Society for Optical Engineering ; v. 9424. 0277-786X
• Author Heading: author. ： Metrology, Inspection, and Process Control for Microlithography (Conference) (29th : 2015 : San Jose, Calif.); Cain, Jason P.; Sanchez, Martha I.
• Publication, Distribution, etc.: Bellingham, Washington, USA : SPIE (出版)
• Publication Date: [2015]; 著作権日付 : ©2015
• Publication Date (W3CDTF): 2015
• Extent: 2 volumes
• Other physical details: illustrations
• Size: 28 cm.
• Alternative Title: Metrology, inspection, and process control for microlithography 29 : 23-26 February 2015 : San Jose, California, United States; SPIE. advanced lithography
• Place of Publication (Country Code): US
• Text Language Code: eng
• Genre/Form Terms: Conference papers and proceedings.
• Content Type: text
• Media Type: unmediated
• Carrier Type: volume
• Subject Heading: Integrated circuits--Inspection--Congresses.; Integrated circuits--Measurement--Congresses.; Microlithography--Congresses.; Process control--Congresses.; Integrated circuits--Inspection.; Integrated circuits--Measurement.; Microlithography.; Process control.
• LCC: TK7874
• DDC: 621.381531
• NDLC: M17
• Target Audience: 一般
• Note (General): Papers.
• Note (Content): 'Proceedings of SPIE' presents the original research papers presented at SPIE conferences and other high-quality conferences in the broad-ranging fields of optics and photonics. These books provide prompt access to the latest innovations in research and technology in their respective fields.
• Note (Bibliography): Includes bibliographical references and author index.
• Holding library: 国立国会図書館
• Call No.: M17-15-3026
• Data Provider (Database): 国立国会図書館 : 国立国会図書館蔵書; https://ndlsearch.ndl.go.jp
• Bibliographic ID (NDL): 026626884; http://id.ndl.go.jp/bib/026626884
• Cataloging Rule: RDA
• Bibliographic Record Category (NDL): 215