図書

ECS transactions

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ECS transactions

資料種別
図書
著者
Electrochemical Society
出版者
The Electrochemical Society
出版年
-
資料形態
ページ数・大きさ等
23 cm
NDC
-
すべて見る

資料に関する注記

一般注記:

Formerly: Electrochemical Society proceedings series

関連資料・改題前後資料

ULSI process integration 5外部サイトState-of-the-art program on compound semiconductors 47 (SOTAPOCS 47) and wide-bandgap semiconductor materials and devices 8外部サイトMolten salts 15 : in memory of Robert Osteryoung外部サイトSolid oxide fuel cells 10 (SOFC-X)外部サイトCopper interconnects, new contact and barrier metallurgies/structures, and low-k interlevel dielectrics III : at the 208th ECS meeting, October 16-21, 2005, Los Angeles, California, USA外部サイトDurability and reliability of low-temperature fuel cells systems外部サイトPorous semiconductors : a symposium held in memory of Vitali Parkhutik and Volker Lehmann外部サイトThin Film Transistor Technology 8外部サイトState-of-the-art program on compound semiconductors 46 (SOTAPOCS 46) and processes at the semiconductor/solution interface 2外部サイトSemiconductor Wafer Bonding : Science, Technology, and Applications外部サイトZnO based thin films, nano-wires, and nano-belts for photonic and electronic devices and sensors外部サイトSiGe and Ge, materials, processing, and devices外部サイトAdvanced gate stack, source/drain and channel engineering for Si-based CMOS 3 : new materials, processes and equipment外部サイトElectrochemistry in mineral and metal processing VII外部サイトPhysics and Chemistry of SiO2 and the Si-SiO2 Interface-5外部サイトAtomic layer deposition applications外部サイトDielectrics for nanosystems II: materials science, processing, reliability, and manufacturing外部サイト30th fuel cell seminar外部サイトPhysics and technology of high-k gate dielectrics外部サイトPhysics and technology of high-k materials 9外部サイトAdvanced gate stack, source/drain and channel engineering for Si-based CMOS 2: new materials, processes, and equipment外部サイトMicroelectronics Technology and Devices : SBMICRO 2007外部サイトChemical Sensors 7 and MEMS/NEMS 7外部サイトSilicon materials science and technology X外部サイトCritical factors in localized corrosion 5 : a symposium in honor of Hugh Isaacs外部サイトSiGe, Ge, and related compounds : materials, processing, and devices外部サイトAdvanced gate stack, source/drain, and channel engineering for si-based CMOS 6 : new materials, processes, and equipment外部サイトDielectrics for nanosystems 4 : materials science, processing, reliability, and manufacturing外部サイトMicroelectronics Technology and Devices : SBMICRO 2006外部サイトCorrosion protective coatings and inhibitors : at the 208th ECS Meeting, October 16-21, 2005, Los Angeles, California, USA外部サイトProton exchange membrane fuel cells外部サイトState-of-the-art program on compound semiconductors 45 (SOTAPOCS 45) and wide bandgap semiconductor materials and devices 7外部サイトState-of-the-Art Program on Compound Semiconductors (SOTAPOCS XLIII) and Nitride and Wide Bandgap Semiconductors for Sensors, Photonics, and Electronics VI外部サイトCleaning and surface conditioning technology in semiconductor device manufacturing 10外部サイトULSI process integration 7外部サイトState-of-the-Art Program on Compound Semiconductors 49 (SOTAPOCS 49) and Nitrides and Wide-Bandgap Semiconductors for Sensors, Photonics, and Electronics 9外部サイトCorrosion and electrochemistry of advanced materials, in Honor of Koji Hashimoto外部サイトDielectrics for nanosystems 3: materials science, processing, reliability, and manufacturing外部サイトFuel cell ceminar 2007外部サイトHigh Purity Silicon 11外部サイトAdvanced gate stack, source/drain and channel engineering for Si-based CMOS 4 : new materials, processes and equipment外部サイトThin Film Transistors 9外部サイトAtomic layer deposition : at the 208th ECS Meeting, October 16-21, 2005, Los Angeles, California, USA外部サイトChemical Sensors 8 : chemical (gas, ion ,bio) sensors and analytical systems外部サイトMagnetic materials, processes, and devices 9外部サイトHigh purity silicon外部サイトCleaning Technology in Semiconductor Device Manufacturing IX外部サイトAnalytical and diagnostic techniques for semiconductor materials, devices and processes 7外部サイトSilicon-on-insulator technology and devices 13外部サイトElectrochemical capacitor and hybrid power batteries 2008外部サイトNanostructured Metal Oxides : Processing and Applications外部サイトSilicon nitride, silicon dioxide, and emerging dielectrics 9外部サイトState-of-the-Art Program on Compound Semiconductors 48 (SOTAPOCS 48) and ZnO, InZnO, and InGaO Related Materials and Devices for Electronic and Photonic Applications外部サイトSolid State Ionic Devices IV外部サイトMolten salts and ionic liquids 18外部サイト

書店で探す

目次

  • ULSI process integration 5

  • State-of-the-art program on compound semiconductors 47 (SOTAPOCS 47) and wide-bandgap semiconductor materials and devices 8

  • Molten salts 15 : in memory of Robert Osteryoung

  • Solid oxide fuel cells 10 (SOFC-X)

  • Copper interconnects, new contact and barrier metallurgies/structures, and low-k interlevel dielectrics III : at the 208th ECS meeting, October 16-21, 2005, Los Angeles, California, USA

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資料種別
図書
タイトル
大きさ
23 cm
並列タイトル等
Electrochemical Society transactions
本文の言語コード
en
対象利用者
一般
一般注記
Formerly: Electrochemical Society proceedings series
関連情報
ULSI process integration 5
State-of-the-art program on compound semiconductors 47 (SOTAPOCS 47) and wide-bandgap semiconductor materials and devices 8
Molten salts 15 : in memory of Robert Osteryoung
Solid oxide fuel cells 10 (SOFC-X)
Copper interconnects, new contact and barrier metallurgies/structures, and low-k interlevel dielectrics III : at the 208th ECS meeting, October 16-21, 2005, Los Angeles, California, USA
Durability and reliability of low-temperature fuel cells systems
Porous semiconductors : a symposium held in memory of Vitali Parkhutik and Volker Lehmann
Thin Film Transistor Technology 8
State-of-the-art program on compound semiconductors 46 (SOTAPOCS 46) and processes at the semiconductor/solution interface 2
Semiconductor Wafer Bonding : Science, Technology, and Applications
ZnO based thin films, nano-wires, and nano-belts for photonic and electronic devices and sensors
SiGe and Ge, materials, processing, and devices
Advanced gate stack, source/drain and channel engineering for Si-based CMOS 3 : new materials, processes and equipment
Electrochemistry in mineral and metal processing VII
Physics and Chemistry of SiO2 and the Si-SiO2 Interface-5
Atomic layer deposition applications
Dielectrics for nanosystems II: materials science, processing, reliability, and manufacturing
30th fuel cell seminar
Physics and technology of high-k gate dielectrics
Physics and technology of high-k materials 9
Advanced gate stack, source/drain and channel engineering for Si-based CMOS 2: new materials, processes, and equipment
Microelectronics Technology and Devices : SBMICRO 2007
Chemical Sensors 7 and MEMS/NEMS 7
Silicon materials science and technology X
Critical factors in localized corrosion 5 : a symposium in honor of Hugh Isaacs
SiGe, Ge, and related compounds : materials, processing, and devices
Advanced gate stack, source/drain, and channel engineering for si-based CMOS 6 : new materials, processes, and equipment
Dielectrics for nanosystems 4 : materials science, processing, reliability, and manufacturing
Microelectronics Technology and Devices : SBMICRO 2006
Corrosion protective coatings and inhibitors : at the 208th ECS Meeting, October 16-21, 2005, Los Angeles, California, USA
Proton exchange membrane fuel cells
State-of-the-art program on compound semiconductors 45 (SOTAPOCS 45) and wide bandgap semiconductor materials and devices 7
State-of-the-Art Program on Compound Semiconductors (SOTAPOCS XLIII) and Nitride and Wide Bandgap Semiconductors for Sensors, Photonics, and Electronics VI
Cleaning and surface conditioning technology in semiconductor device manufacturing 10
ULSI process integration 7
State-of-the-Art Program on Compound Semiconductors 49 (SOTAPOCS 49) and Nitrides and Wide-Bandgap Semiconductors for Sensors, Photonics, and Electronics 9
Corrosion and electrochemistry of advanced materials, in Honor of Koji Hashimoto
Dielectrics for nanosystems 3: materials science, processing, reliability, and manufacturing
Fuel cell ceminar 2007
High Purity Silicon 11
Advanced gate stack, source/drain and channel engineering for Si-based CMOS 4 : new materials, processes and equipment
Thin Film Transistors 9
Atomic layer deposition : at the 208th ECS Meeting, October 16-21, 2005, Los Angeles, California, USA
Chemical Sensors 8 : chemical (gas, ion ,bio) sensors and analytical systems
Magnetic materials, processes, and devices 9
High purity silicon
Cleaning Technology in Semiconductor Device Manufacturing IX
Analytical and diagnostic techniques for semiconductor materials, devices and processes 7
Silicon-on-insulator technology and devices 13
Electrochemical capacitor and hybrid power batteries 2008
Nanostructured Metal Oxides : Processing and Applications
Silicon nitride, silicon dioxide, and emerging dielectrics 9
State-of-the-Art Program on Compound Semiconductors 48 (SOTAPOCS 48) and ZnO, InZnO, and InGaO Related Materials and Devices for Electronic and Photonic Applications
Solid State Ionic Devices IV
Molten salts and ionic liquids 18