EMLC 2005 : 21st European Mask and Lithography Conference : 31 January-3 February, 2005, Dresden, Germany

• 資料種別: 図書
• ISBN: 0819458309
• タイトル: EMLC 2005 : 21st European Mask and Lithography Conference : 31 January-3 February, 2005, Dresden, Germany
• 著者・編者: Uwe F.W. Behringer, chair/editor ; organized by VDE/VDI--the Society for Microelectronics, Micro- and Precision Engineering (Germany) [and] Institute for Microstructure Technology/Forschungszentrum Karlsruhe (Germany) ; cooperating organizations, SEMI Europe ... [et al.] ; copublished by, SPIE--the International Society for Optical Engineering and VDE Verlag GmbH (Germany)
• 著者標目: European Conference on Mask Technology for Integrated Circuits and Microcomponents; Behringer, Uwe F. W.; VDE/VDI-Gesellschaft für Mikroelektronik, Mikro- und Feinwerktechnik; Institut für Mikrostrukturtechnik; SEMI-Europe; Society of Photo-optical Instrumentation Engineers; https://ci.nii.ac.jp/author/DA00848546
• 出版事項: SPIE; VDE Verlag GmbH
• 出版年月日等: c2005
• 出版年（W3CDTF）: 2005
• 大きさ: 28 cm
• 並列タイトル等: European Mask and Lithography Conference; European Conference on Mask Technology for Integrated Circuits and Microcomponents; Mask and lithography
• 出版地（国名コード）: us
• 本文の言語コード: en
• 件名標目: Integrated circuits -- Masks -- Congresses; Microlithography -- Congresses
• LCC: TK7872.M3
• 対象利用者: 一般
• 一般注記: Includes bibliographical references and author index
• 関連情報: Proceedings; https://cir.nii.ac.jp/crid/1130282269217551104
• 関連情報（URI）: https://ci.nii.ac.jp/ncid/BA8605470X#entity; https://lccn.loc.gov/2006273846
• 掲載誌: Proceedings; https://cir.nii.ac.jp/crid/1130282269217551104
• 連携機関・データベース: 国立情報学研究所 : CiNii Research
• 提供元機関・データベース: CiNii Books; https://ci.nii.ac.jp/books
• NACSIS書誌ID（NCID）: https://ci.nii.ac.jp/ncid/BA8605470X : BA8605470X
• LC control number: 2006273846; https://lccn.loc.gov/2006273846