Electrical Properties of Ultrathin SiO₂ Layer Deposited at 50℃ by Inductively Coupled Plasma-Enahnced Chemical Vapor Deposition

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Material Type: 記事
Title: Electrical Properties of Ultrathin SiO₂ Layer Deposited at 50℃ by Inductively Coupled Plasma-Enahnced Chemical Vapor Deposition
Author/Editor: Giovanni Mannino
Rosa Ruggeri
Alessandra Alberti 他
Author Heading: Giovanni Mannino
Rosa Ruggeri
Alessandra Alberti
Periodical title: Applied physics express : APEX
No. or year of volume/issue: 5(2):2012.2
Volume: 5
Issue: 2
Pages: 021103-1-3
Publication date of volume/issue (W3CDTF): 2012-02
ISSN (Periodical Title): 1882-0778
ISSN-L (Periodical Title): 1882-0778
Publication (Periodical Title): Tokyo : Japan Society of Applied Physics
Place of Publication (Country Code): JP
Text Language Code: eng
NDLC: ZM35
Target Audience: 一般
Holding library: 国立国会図書館
Call No.: Z78-A526
Data Provider (Database): 国立国会図書館 : 国立国会図書館雑誌記事索引
https://ndlsearch.ndl.go.jp
Bibliographic ID (NDL): 023454278
http://id.ndl.go.jp/bib/023454278
Bibliographic Record Category (NDL): 632