3次元トポロジカル絶縁体Bi₂-xSbxTe₃-ySey薄膜の合成と物性評価 (強磁場下の物性の研究 : 輸送現象)

3次元トポロジカル絶縁体Bi₂-xSbxTe₃-ySey薄膜の合成と物性評価

(強磁場下の物性の研究 : 輸送現象)

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Material Type: 記事
Title: 3次元トポロジカル絶縁体Bi₂-xSbxTe₃-ySey薄膜の合成と物性評価
Author/Editor: 田邉洋一
Tu Ngoc Han
Khuong Kim Huynh 他
Series Title: 強磁場下の物性の研究 : 輸送現象
Author Heading: 田邉洋一
Tu Ngoc Han
Khuong Kim Huynh
Alternative Title: Van der Waals Epitaxial Growth of Three Dimensional Topological Insulator Bi₂-xSbxTe₃-ySey Thin Film
Periodical title: 東北大学金属材料研究所強磁場超伝導材料研究センター年次報告
No. or year of volume/issue: 2014年度
Pages: 123-125
Publication date of volume/issue (W3CDTF): 2014
Publication (Periodical Title): [仙台] : 東北大学金属材料研究所附属強磁場超伝導材料研究センター
Place of Publication (Country Code): JP
Text Language Code: jpn
NDLC: ZM35
Target Audience: 一般
Holding library: 国立国会図書館
Call No.: Z15-672
Data Provider (Database): 国立国会図書館 : 国立国会図書館雑誌記事索引
https://ndlsearch.ndl.go.jp
Bibliographic ID (NDL): 026705149
http://id.ndl.go.jp/bib/026705149
Bibliographic Record Category (NDL): 632