ビスフェノールAとホルムアルデヒドを用いたノボラック樹脂の合成と性質 : ビスフェノール類に着眼した柔軟性をもつフォトレジスト材の開発

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Material Type: 記事
Title: ビスフェノールAとホルムアルデヒドを用いたノボラック樹脂の合成と性質 : ビスフェノール類に着眼した柔軟性をもつフォトレジスト材の開発
Author/Editor: 山﨑博人
西村利康
山﨑椋太
江口まり音
Author Heading: 山﨑博人
西村利康
山﨑椋太
江口まり音
Alternative Title: Synthesis and Properties of Bisphenol A-Formaldehyde Novolac Resins : Development of Photo-resist Material Having Flexibility Noticed with Bisphenol Unit
Periodical title: ネットワークポリマー = Journal of network polymer, Japan
No. or year of volume/issue: 38(4):2017
Volume: 38
Issue: 4
Pages: 173-183
Publication date of volume/issue (W3CDTF): 2017
ISSN (Periodical Title): 1342-0577
ISSN-L (Periodical Title): 1342-0577
Publication (Periodical Title): 東京 : 合成樹脂工業協会
Place of Publication (Country Code): JP
Text Language Code: jpn
Subject Heading: Bisphenol A
Formaldehyde
Flexibility
Novolac-resin
Photo-resist
NDLC: ZP17
Target Audience: 一般
Holding library: 国立国会図書館
Call No.: Z17-845
Data Provider (Database): 国立国会図書館 : 国立国会図書館雑誌記事索引
https://ndlsearch.ndl.go.jp
Bibliographic ID (NDL): 028391199
http://id.ndl.go.jp/bib/028391199
Bibliographic Record Category (NDL): 632