ビス(メトキシメチル)ビフェニルを用いたノボラック樹脂の合成と性質 : ビスフェノール類に着眼した柔軟性をもつフォトレジスト材の開発

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Material Type: 記事
Title: ビス(メトキシメチル)ビフェニルを用いたノボラック樹脂の合成と性質 : ビスフェノール類に着眼した柔軟性をもつフォトレジスト材の開発
Author/Editor: 山﨑博人
中野小百合
古本貴久
黒岩貞昭
高林誠一郎
Author Heading: 山﨑博人
中野小百合
古本貴久
黒岩貞昭
高林誠一郎
Alternative Title: Synthesis and Properties of Bisphenol A-Bis(methoxymethyl)biphenyl Novolac Resin : Development of Photo-resist Material Having Flexibility Noticed with Bisphenol unit
Periodical title: Journal of network polymer, Japan = ネットワークポリマー論文集
No. or year of volume/issue: 39(5):2018
Volume: 39
Issue: 5
Pages: 219-229
Publication date of volume/issue (W3CDTF): 2018
ISSN (Periodical Title): 2433-3786
ISSN-L (Periodical Title): 2433-3786
Publication (Periodical Title): 東京 : 合成樹脂工業協会
Place of Publication (Country Code): JP
Text Language Code: jpn
Subject Heading: 4,4'-Bis(methoxymethyl)-biphenyl
Bisphenol A
Pyrogallol
Flexibility
Photo-resist
NDLC: ZP17
Target Audience: 一般
Holding library: 国立国会図書館
Call No.: Z17-845
Data Provider (Database): 国立国会図書館 : 国立国会図書館雑誌記事索引
https://ndlsearch.ndl.go.jp
Bibliographic ID (NDL): 029268313
http://id.ndl.go.jp/bib/029268313
Bibliographic Record Category (NDL): 632