窒化ガリウムスパッタリングターゲットを用いたSi基板上エピタキシャル成膜と評価
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- Material Type
- 記事
- Author/Editor
- 末本 祐也上岡 義弘召田 雅実Liwen SANG長田 貴弘知京 豊裕
- Alternative Title
- Fabrication and Characterization of Epitaxial Film on Si Substrate with GaN Sputtering Target
- Periodical title
- 東ソー研究・技術報告 = Tosoh research & technology review / 東ソー株式会社東ソー研究・技術報告編集委員会 編
- No. or year of volume/issue
- 65(102):2021
- Volume
- 65
- Issue
- 102
- Pages
- 3-10