触媒表面を基準面とした光学材料、半導体材料表面の超平滑化エッチング法 (物理化学ナノ製造プロセスの最前線)

触媒表面を基準面とした光学材料、半導体材料表面の超平滑化エッチング法

(物理化学ナノ製造プロセスの最前線)

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Material Type: 記事
Title: 触媒表面を基準面とした光学材料、半導体材料表面の超平滑化エッチング法
Author/Editor: 佐野泰久
Series Title: 物理化学ナノ製造プロセスの最前線
Author Heading: 佐野泰久
Periodical title: 日本機械学会誌
No. or year of volume/issue: 126(1259):2023.10
Volume: 126
Issue: 1259
Pages: 14-17
Publication date of volume/issue (W3CDTF): 2023-10
ISSN (Periodical Title): 0021-4728
ISSN-L (Periodical Title): 0021-4728
Publication (Periodical Title): 東京 : 日本機械学会 ; 1938-
Place of Publication (Country Code): JP
Text Language Code: jpn
NDLC: ZN11
Target Audience: 一般
Holding library: 国立国会図書館
Call No.: Z16-110
Data Provider (Database): 国立国会図書館 : 国立国会図書館雑誌記事索引
https://ndlsearch.ndl.go.jp
Bibliographic ID (NDL): 033117821
http://id.ndl.go.jp/bib/033117821
Bibliographic Record Category (NDL): 632