プラズマCVD法によるシリコン系薄膜の成長 : 気相・表面・膜中の反応と薄膜の高品質化(特集プラズマが誘起する表面反応の制御による膜作製)

Journal name: 表面と真空 = Vacuum and surface science / 日本表面科学会, 日本真空学会編 67(2):2024.2

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Material Type: 記事
Title: プラズマCVD法によるシリコン系薄膜の成長 : 気相・表面・膜中の反応と薄膜の高品質化
Author/Editor: 布村正太
近藤道雄
Series Title: 特集プラズマが誘起する表面反応の制御による膜作製
Author Heading: 布村正太
近藤道雄
Alternative Title: Thin-film Silicon Growth by Plasma-enhanced CVD : Gas-phase, Surface and In-film Reactions for High-quality Film Formation
Periodical title: 表面と真空 = Vacuum and surface science / 日本表面科学会, 日本真空学会編
No. or year of volume/issue: 67(2):2024.2
Volume: 67
Issue: 2
Pages: 44-51
Publication date of volume/issue (W3CDTF): 2024-02
ISSN (Periodical Title): 2433-5835
ISSN-L (Periodical Title): 2433-5835
Publication (Periodical Title): 東京 : 日本表面科学会 ; 2018-
Place of Publication (Country Code): JP
Text Language Code: jpn
NDLC: ZN15
Target Audience: 一般
Holding library: 国立国会図書館
Call No.: Z16-474
Data Provider (Database): 国立国会図書館 : 国立国会図書館雑誌記事索引
https://ndlsearch.ndl.go.jp
Bibliographic ID (NDL): 033346026
http://id.ndl.go.jp/bib/033346026
Bibliographic Record Category (NDL): 632