容量結合型プラズマによる高速シリコン深掘り技術(小特集シリコン深掘り加工技術)

Holdings of Libraries in Japan

This page shows libraries in Japan other than the National Diet Library that hold the material.

Please contact your local library for information on how to use materials or whether it is possible to request materials from the holding libraries.

other

CiNii Research
Search Service
Digital
You can check the holdings of institutions and databases with which CiNii Research is linked at the site of CiNii Research.
Check the holdings of this book

You can check the details of this material, its authority (keywords that refer to materials on the same subject, author's name, etc.), etc.

Material Type: 記事
Title: 容量結合型プラズマによる高速シリコン深掘り技術
Author/Editor: 酒井伊都子
櫻井典子
大岩徳久
Series Title: 小特集シリコン深掘り加工技術
Author Heading: 酒井伊都子
櫻井典子
大岩徳久
Alternative Title: High rate deep Si etching using capacitively coupled plasma
Periodical title: Journal of the Vacuum Society of Japan = 真空
No. or year of volume/issue: 53(7) 2010.7
Volume: 53
Issue: 7
Pages: 429～434
Publication date of volume/issue (W3CDTF): 2010-07
ISSN (Periodical Title): 1882-2398
ISSN-L (Periodical Title): 1882-2398
Publication (Periodical Title): 東京 : 日本真空協会
Place of Publication (Country Code): JP
Text Language Code: jpn
NDLC: ZN15
Target Audience: 一般
Holding library: 国立国会図書館
Call No.: Z16-474
Data Provider (Database): 国立国会図書館 : 国立国会図書館雑誌記事索引
https://ndlsearch.ndl.go.jp
Bibliographic ID (NDL): 10785920
http://id.ndl.go.jp/bib/10785920
Bibliographic Record Category (NDL): 632