Poly(etheretherketone)(PEEK)をターゲットとした高周波スパッタリング法による薄膜作製とその評価

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Material Type: 記事
Title: Poly(etheretherketone)(PEEK)をターゲットとした高周波スパッタリング法による薄膜作製とその評価
Author/Editor: 内田大宇
長谷川周彦
祖父江英哲他
Author Heading: 内田大宇
長谷川周彦
祖父江英哲
Alternative Title: Evaluation of thin films prepared by r.f. sputtering with a poly(etheretherketone) target
Periodical title: Journal of the Vacuum Society of Japan = 真空
No. or year of volume/issue: 53(7) 2010.7
Volume: 53
Issue: 7
Pages: 458～462
Publication date of volume/issue (W3CDTF): 2010-07
ISSN (Periodical Title): 1882-2398
ISSN-L (Periodical Title): 1882-2398
Publication (Periodical Title): 東京 : 日本真空協会
Place of Publication (Country Code): JP
Text Language Code: jpn
NDLC: ZN15
Target Audience: 一般
Holding library: 国立国会図書館
Call No.: Z16-474
Data Provider (Database): 国立国会図書館 : 国立国会図書館雑誌記事索引
https://ndlsearch.ndl.go.jp
Bibliographic ID (NDL): 10785958
http://id.ndl.go.jp/bib/10785958
Bibliographic Record Category (NDL): 632