雑誌東京電機大学工学部研究報告
Volume number(42)
Article低周波(200kHz...

低周波(200kHz)CH4プラズマによるa-C:Hの成膜

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低周波(200kHz)CH4プラズマによるa-C:Hの成膜

Call No. (NDL)
Z16-312
Bibliographic ID of National Diet Library
3627875
Material type
記事
Author
大谷 義和ほか
Publisher
東京 : 東京電機大学工学部
Publication date
1994-12
Material Format
Digital
Journal name
東京電機大学工学部研究報告 / 東京電機大学工学部 編 (通号 42) 1994.12
Publication Page
p.p29～36
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Digital

Material Type
記事
Title
低周波(200kHz)CH4プラズマによるa-C:Hの成膜
Author/Editor
大谷 義和
六倉 信喜
Author Heading
大谷 義和
六倉 信喜
Periodical title
東京電機大学工学部研究報告 / 東京電機大学工学部 編
No. or year of volume/issue
(通号 42) 1994.12
Sequential issue number
42
Pages
p29～36
Publication date of volume/issue (W3CDTF)
1994-12
ISSN (Periodical Title)
0389-617X