低周波(200kHz)CH4プラズマによるa-C:Hの成膜
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- Material Type
- 記事
- Author/Editor
- 大谷 義和六倉 信喜
- Periodical title
- 東京電機大学工学部研究報告 / 東京電機大学工学部 編
- No. or year of volume/issue
- (通号 42) 1994.12
- Sequential issue number
- 42
- Pages
- p29～36
- Publication date of volume/issue (W3CDTF)
- 1994-12
- ISSN (Periodical Title)
- 0389-617X