記事

Selective Area Growth of GaN on Si Substrate Using SiO2 Mask by Metalorganic Vapor Phase Epitaxy

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Selective Area Growth of GaN on Si Substrate Using SiO2 Mask by Metalorganic Vapor Phase Epitaxy

Call No. (NDL)
Z54-J337
Bibliographic ID of National Diet Library
4550597
Material type
記事
Author
Yasutoshi Kawaguchiほか
Publisher
Tokyo : Japan Society of Applied Physics
Publication date
1998-08
Material Format
Paper
Journal name
Japanese journal of applied physics. Pt. 2, Letters 37(8B) 1998.08
Publication Page
p.L966~969
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Paper Digital

Material Type
記事
Author/Editor
Yasutoshi Kawaguchi
Yoshio Honda
Hidetaka Matsushima 他
Periodical title
Japanese journal of applied physics. Pt. 2, Letters
No. or year of volume/issue
37(8B) 1998.08
Volume
37
Issue
8B
Pages
L966~969
Publication date of volume/issue (W3CDTF)
1998-08