スパッタ法によるニオブ酸カリウム薄膜の配向性制御
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- Material Type
- 記事
- Author/Editor
- 橋間 英和小西 明男若林 肇 他
- Periodical title
- 真空 = Journal of the Vacuum Society of Japan
- No. or year of volume/issue
- 42(5) 1999.05
- Volume
- 42
- Issue
- 5
- Pages
- 581～584
- Publication date of volume/issue (W3CDTF)
- 1999-05
- ISSN (Periodical Title)
- 0559-8516
- ISSN-L (Periodical Title)
- 0559-8516
- Publication (Periodical Title)
- 東京 : 日本真空協会
- Place of Publication (Country Code)
- JP
- Text Language Code
- jpn
- NDLC
- Target Audience
- 一般
- Holding library
- 国立国会図書館
- Call No.
- Z16-474
- Data Provider (Database)
- 国立国会図書館 : 国立国会図書館雑誌記事索引
- Bibliographic ID (NDL)
- 4761237
- Bibliographic Record Category (NDL)
- 632
- Summary, etc.
- Potassium niobate thin films were prepared on amorphous (SrO-SiO<SUB>2</SUB>) layer/Si wafer by means of RF magnetron sputtering using a (KNbO<SUB>3</SUB>+ K<SUB>2</SUB>CO<SUB>3</SUB>) mixed powder target. Amorphous (SrO-SiO<SUB>2</SUB>) layers under the potassium niobate thin films were prepared by means of RF magnetron sputtering using a (SrCO<SUB>3</SUB> + SiO<SUB>2</SUB>) mixed powder target. Crystallization and orientation of the potassium niobate thin films depended on (KNbO<SUB>3</SUB> + K<SUB>2</SUB>CO<SUB>3</SUB>) target compositions and amorphous (SrO-SiO<SUB>2</SUB>) layer target compositions under the potassium niobate thin films. The orientation of potassium niobate thin films could be controlled by a favorable choice of (KNbO<SUB>3</SUB> + K<SUB>2</SUB>CO<SUB>3</SUB>) target compositions and amorphous (SrO-SiO<SUB>2</SUB>) layer target compositions, and produced highly [110] oriented perovskite type potassium niobate thin films.
- DOI
- 10.3131/jvsj.42.581
- Access Restrictions
- インターネット公開
- Data Provider (Database)
- 科学技術振興機構 : J-STAGE
- Summary, etc.
- Potassium niobate thin films were prepared on amorphous (SrO-SiO<SUB>2</SUB>) layer/Si wafer by means of RF magnetron sputtering using a (KNbO<SUB>3</SUB>+ K<SUB>2</SUB>CO<SUB>3</SUB>) mixed powder target. Amorphous (SrO-SiO<SUB>2</SUB>) layers under the potassium niobate thin films were prepared by means of RF magnetron sputtering using a (SrCO<SUB>3</SUB> + SiO<SUB>2</SUB>) mixed powder target. Crystallization and orientation of the potassium niobate thin films depended on (KNbO<SUB>3</SUB> + K<SUB>2</SUB>CO<SUB>3</SUB>) target compositions and amorphous (SrO-SiO<SUB>2</SUB>) layer target compositions under the potassium niobate thin films. The orientation of potassium niobate thin films could be controlled by a favorable choice of (KNbO<SUB>3</SUB> + K<SUB>2</SUB>CO<SUB>3</SUB>) target compositions and amorphous (SrO-SiO<SUB>2</SUB>) layer target compositions, and produced highly [110] oriented perovskite type potassium niobate thin films.
- DOI
- 10.3131/jvsj.42.581
- Access Restrictions
- インターネット公開
- Related Material (URI)
- Data Provider (Database)
- 国立情報学研究所 : CiNii Research
- Original Data Provider (Database)
- Japan Link Center雑誌記事索引データベースCrossrefCiNii Articles
- Bibliographic ID (NDL)
- 4761237
- NAID
- 10004568012