Measurement Technique for the Evaluation of Residual Stress in Epitaxial Thin Film by Asymmetric X-Ray Diffraction

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Measurement Technique for the Evaluation of Residual Stress in Epitaxial Thin Film by Asymmetric X-Ray Diffraction

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Material Type: 記事
Title: Measurement Technique for the Evaluation of Residual Stress in Epitaxial Thin Film by Asymmetric X-Ray Diffraction
Author/Editor: 内田寛
木口賢紀
佐伯淳他
Author Heading: 内田寛
木口賢紀
佐伯淳
Alternative Title: 非対称X線回折によるエピタキシャル薄膜の残留応力の評価手法
Periodical title: 日本セラミックス協会学術論文誌 / 日本セラミックス協会 [編]
No. or year of volume/issue: 107 (通号 1247) 1999.07
Volume: 107
Sequential issue number: 1247
Pages: 606～610
Publication date of volume/issue (W3CDTF): 1999-07
ISSN (Periodical Title): 0914-5400
ISSN-L (Periodical Title): 0914-5400
Publication (Periodical Title): 東京 : 日本セラミックス協会
Place of Publication (Country Code): JP
Text Language Code: eng
NDLC: ZP9
Target Audience: 一般
Holding library: 国立国会図書館
Call No.: Z17-249
Data Provider (Database): 国立国会図書館 : 国立国会図書館雑誌記事索引
https://ndlsearch.ndl.go.jp
Bibliographic ID (NDL): 4769737
http://id.ndl.go.jp/bib/4769737
Bibliographic Record Category (NDL): 632