Nanoscale analysis of electron irradiation-enhanced diffusion process on the multilayer interfaces of W-Al2O3-Ti/Cu

Publisher: Oxford : Published for the Japanese Society of Electron Microscopy by Oxford University Press

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Material Type: 記事
Title: Nanoscale analysis of electron irradiation-enhanced diffusion process on the multilayer interfaces of W-Al2O3-Ti/Cu
Author/Editor: Shigemasa Ohta
Heishichiro Takahashi
Author Heading: Shigemasa Ohta
Heishichiro Takahashi
Periodical title: Journal of electron microscopy
No. or year of volume/issue: 48(6) 1999
Volume: 48
Issue: 6
Pages: 899～903
Publication date of volume/issue (W3CDTF): 1999
ISSN (Periodical Title): 0022-0744
Publication (Periodical Title): Oxford : Published for the Japanese Society of Electron Microscopy by Oxford University Press
Place of Publication (Country Code): GB
Text Language Code: eng
NDLC: ZN33
Target Audience: 一般
Holding library: 国立国会図書館
Call No.: Z53-T76
Data Provider (Database): 国立国会図書館 : 国立国会図書館雑誌記事索引
https://ndlsearch.ndl.go.jp
Bibliographic ID (NDL): 4976740
http://id.ndl.go.jp/bib/4976740
Bibliographic Record Category (NDL): 632