Role of Ultra Thin SiOx Layer for Epitaxial Growth of YSZ/SiOx/(001)Si Thin Films (Special Issue Ceramics Integration)

Digital data available（Japan Link Center）

CiNii Research

Role of Ultra Thin SiOx Layer for Epitaxial Growth of YSZ/SiOx/(001)Si Thin Films(Special Issue Ceramics Integration)

Holdings of Libraries in Japan

This page shows libraries in Japan other than the National Diet Library that hold the material.

Please contact your local library for information on how to use materials or whether it is possible to request materials from the holding libraries.

other

CiNii Research
Search Service
Digital
You can check the holdings of institutions and databases with which CiNii Research is linked at the site of CiNii Research.
Check the holdings of this book

You can check the details of this material, its authority (keywords that refer to materials on the same subject, author's name, etc.), etc.

Material Type: 記事
Title: Role of Ultra Thin SiOx Layer for Epitaxial Growth of YSZ/SiOx/(001)Si Thin Films
Author/Editor: 木口賢紀
脇谷尚樹
篠崎和夫他
Series Title: Special Issue Ceramics Integration
Author Heading: 木口賢紀
脇谷尚樹
篠崎和夫
Alternative Title: YSZ/SiOx/(001)Si薄膜のエピタキシャル成長における極薄SiOx層の役割
Periodical title: 日本セラミックス協会学術論文誌 / 日本セラミックス協会 [編]
No. or year of volume/issue: 110(1281) 2002.5
Volume: 110
Issue: 1281
Pages: 338～342
Publication date of volume/issue (W3CDTF): 2002-05
ISSN (Periodical Title): 0914-5400
ISSN-L (Periodical Title): 0914-5400
Publication (Periodical Title): 東京 : 日本セラミックス協会
Place of Publication (Country Code): JP
Text Language Code: eng
Subject Heading: HRTEM
In-situ TEM
Buffer layer
Epitaxy
Strain relaxation
PLD
NDLC: ZP9
Target Audience: 一般
Holding library: 国立国会図書館
Call No.: Z17-249
Data Provider (Database): 国立国会図書館 : 国立国会図書館雑誌記事索引
https://ndlsearch.ndl.go.jp
Bibliographic ID (NDL): 6154148
http://id.ndl.go.jp/bib/6154148
Bibliographic Record Category (NDL): 632