Impact of Hf Metal Predeposition on the Properties of HfO2 Grown by Physical and Chemical Vapor Deposition (Special Issue: Solid State Devices & Materials)

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Impact of Hf Metal Predeposition on the Properties of HfO2 Grown by Physical and Chemical Vapor Deposition(Special Issue: Solid State Devices & Materials)

Call No. (NDL)
Z53-A375
Bibliographic ID of National Diet Library
6522920
Material type
記事
Author
Kazuhiko Yamamotoほか
Publisher
Tokyo : Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physics
Publication date
2003-04
Material Format
Digital
Journal name
Japanese journal of applied physics. Part. 1, Regular papers, brief communications & review papers : JJAP 42(4B) (通号 574) (Special Issue) 2003.4
Publication Page
p.1835~1839
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Detailed bibliographic record

Summary, etc.:

Electrical and microstructural properties of a hafnium oxide (HfO<SUB>2</SUB>) grown by physical vapor deposition (PVD) and chemical vapor deposition ...

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Bibliographic Record

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Digital

Material Type
記事
Author/Editor
Kazuhiko Yamamoto
Shigenori Hayashi
Masaaki Niwa 他
Periodical title
Japanese journal of applied physics. Part. 1, Regular papers, brief communications & review papers : JJAP
No. or year of volume/issue
42(4B) (通号 574) (Special Issue) 2003.4
Volume
42
Issue
4B
Sequential issue number
574