Invited Key Technology Development for EUVL Mask Fabrication (2004 Asia-Pacific Workshop on Fundamentals and Application of Advanced Semiconductor Devices(AWAD 2004) ; Session A8 Nano-Lithography)

Invited Key Technology Development for EUVL Mask Fabrication

(2004 Asia-Pacific Workshop on Fundamentals and Application of Advanced Semiconductor Devices(AWAD 2004) ; Session A8 Nano-Lithography)

Call No. (NDL): Z16-940
Bibliographic ID of National Diet Library: 7036646

Material type: 記事

Author: Jinho Ahnほか

Publisher: 東京 : 電子情報通信学会

Publication date: 2004-07-02

Material Format: Paper

Journal name: 電子情報通信学会技術研究報告 = IEICE technical report : 信学技報 104(157) 2004.7.2

Publication Page: p.1～4

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Paper

Material Type: 記事
Title: Invited Key Technology Development for EUVL Mask Fabrication
Author/Editor: Jinho Ahn
Taegeun Kim
Seungyoon Lee
Series Title: 2004 Asia-Pacific Workshop on Fundamentals and Application of Advanced Semiconductor Devices(AWAD 2004) ; Session A8 Nano-Lithography
Author Heading: Jinho Ahn
Taegeun Kim
Seungyoon Lee
Periodical title: 電子情報通信学会技術研究報告 = IEICE technical report : 信学技報
No. or year of volume/issue: 104(157) 2004.7.2
Volume: 104
Issue: 157
Pages: 1～4
Publication date of volume/issue (W3CDTF): 2004-07-02
ISSN (Periodical Title): 0913-5685
ISSN-L (Periodical Title): 0913-5685
Publication (Periodical Title): 東京 : 電子情報通信学会
Place of Publication (Country Code): JP
Text Language Code: eng
Subject Heading: Extreme Ultraviolet
Lithography
Multilayer
Defect
NDLC: ZN33
Target Audience: 一般
Report No. (Article): SDM2004-106
Holding library: 国立国会図書館
Call No.: Z16-940
Data Provider (Database): 国立国会図書館 : 国立国会図書館雑誌記事索引
https://ndlsearch.ndl.go.jp
Bibliographic ID (NDL): 7036646
http://id.ndl.go.jp/bib/7036646
Bibliographic Record Category (NDL): 632