表面波励起プラズマによる中性水素原子生成とレジストアッシングへの応用(特集 2003年度実施の地域との共同研究の報告)

Journal name: 室蘭工業大学紀要 = Memoirs of the Muroran Institute of Technology / 室蘭工業大学編 (54) 2004.11

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Material Type: 記事
Title: 表面波励起プラズマによる中性水素原子生成とレジストアッシングへの応用
Author/Editor: 福田永
田中茂雄
渡邊幹夫他
Series Title: 特集 2003年度実施の地域との共同研究の報告
Author Heading: 福田永
田中茂雄
渡邊幹夫
Periodical title: 室蘭工業大学紀要 = Memoirs of the Muroran Institute of Technology / 室蘭工業大学編
No. or year of volume/issue: (54) 2004.11
Issue: 54
Pages: 29～35
Publication date of volume/issue (W3CDTF): 2004-11
ISSN (Periodical Title): 1344-2708
ISSN-L (Periodical Title): 1344-2708
Publication (Periodical Title): 室蘭 : 室蘭工業大学
Place of Publication (Country Code): JP
Text Language Code: jpn
Subject Heading: Plasma processing
Silicon process technology
Ashing
Neutral hydrogen
NDLC: ZV1
Target Audience: 一般
Holding library: 国立国会図書館
Call No.: Z22-477
Data Provider (Database): 国立国会図書館 : 国立国会図書館雑誌記事索引
https://ndlsearch.ndl.go.jp
Bibliographic ID (NDL): 7178402
http://id.ndl.go.jp/bib/7178402
Bibliographic Record Category (NDL): 632