High-k、Metal Gate用成膜装置「C-7100GT」の開発--スパッタ成膜法を用いたゲートプロセスへの取り組み

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Material Type: 記事
Title: High-k、Metal Gate用成膜装置「C-7100GT」の開発--スパッタ成膜法を用いたゲートプロセスへの取り組み
Author/Editor: 小須田求
山田直樹
松井尚子他
Author Heading: 小須田求
山田直樹
松井尚子
Periodical title: アネルバ技報
No. or year of volume/issue: 11 2005
Volume: 11
Pages: 20～24
Publication date of volume/issue (W3CDTF): 2005
ISSN (Periodical Title): 1342-2979
ISSN-L (Periodical Title): 1342-2979
Publication (Periodical Title): 府中 (東京都) : アネルバ
Place of Publication (Country Code): JP
Text Language Code: jpn
NDLC: ZM5
Target Audience: 一般
Holding library: 国立国会図書館
Call No.: Z14-B382
Data Provider (Database): 国立国会図書館 : 国立国会図書館雑誌記事索引
https://ndlsearch.ndl.go.jp
Bibliographic ID (NDL): 7323185
http://id.ndl.go.jp/bib/7323185
Bibliographic Record Category (NDL): 632