The Impact of Fluoropolymers on Line Edge Roughness in 193 nm Imaging

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Material Type: 記事
Title: The Impact of Fluoropolymers on Line Edge Roughness in 193 nm Imaging
Author/Editor: F. C. Zumsteg
K. W. Leffew
A. E. Feiring 他
Author Heading: F. C. Zumsteg
K. W. Leffew
A. E. Feiring
Periodical title: Journal of photopolymer science and technology
No. or year of volume/issue: 18(4) 2005
Volume: 18
Issue: 4
Pages: 467～469
Publication date of volume/issue (W3CDTF): 2005
ISSN (Periodical Title): 0914-9244
ISSN-L (Periodical Title): 0914-9244
Publication (Periodical Title): Chiba : The Society of Photopolymer Science and Technology
Place of Publication (Country Code): JP
Text Language Code: eng
Subject Heading: TFE
photoresist
dissolution rate
NDLC: ZP48
Target Audience: 一般
Holding library: 国立国会図書館
Call No.: Z53-W515
Data Provider (Database): 国立国会図書館 : 国立国会図書館雑誌記事索引
https://ndlsearch.ndl.go.jp
Bibliographic ID (NDL): 7338397
http://id.ndl.go.jp/bib/7338397
Bibliographic Record Category (NDL): 632