ArF液浸用レジストのC60イオンビームを用いたXPS深さ方向状態解析 (第26回表面科学講演大会論文特集(1))
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- Material Type
- 記事
- Author/Editor
- 山本 雄一代田 直子山本 清
- Series Title
- Alternative Title
- XPS depth profile analysis of ArF immersion resists by using C60 ion beam
- Periodical title
- 表面科学 = Journal of the Surface Science Society of Japan / 日本表面科学会 編
- No. or year of volume/issue
- 28(7) 2007.7
- Volume
- 28
- Issue
- 7