CHF3 Plasma Treatment of Si Field Emitter Arrays For No Damage Vacuum Packaging. 39 7B

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CHF3 Plasma Treatment of Si Field Emitter Arrays For No Damage Vacuum Packaging.

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Summary, etc.：: Si field emitter arrays (FEAs) are promising cold cathodes for field emission displays (FEDs). The emission current from the Si FEAs, however, is know...

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Material Type: 記事
Title: CHF3 Plasma Treatment of Si Field Emitter Arrays For No Damage Vacuum Packaging.
Volume: 39
7B
Author/Editor: Nagao Masayoshi
Tanabe Hisao
Matsukawa Takashi
Kanemaru Seigo
Itoh Junji
Author Heading: Nagao Masayoshi
Tanabe Hisao
Matsukawa Takashi
Kanemaru Seigo
Itoh Junji
Publication Date: 2000
Publication Date (W3CDTF): 2000
Periodical title: Japanese Journal of Applied Physics
No. or year of volume/issue: 39 7B
Volume: 39
Issue: 7B
Pages: L755-L756
ISSN (Periodical Title): 0021-4922
1347-4065
Subject Heading: CHF<FONT SIZE="-1"><SUB>3</SUB></FONT> plasma
surface modification
vacuum sealing
field emitter
vacuum microelectronics
Target Audience: 一般
DOI: 10.1143/jjap.39.L755
Access Restrictions: インターネット公開
Data Provider (Database): 科学技術振興機構 : J-STAGE
http://www.jstage.jst.go.jp