Development of Photocuring Acrylic/silica Organic-Inorganic Hybrid for Negative Resists

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Development of Photocuring Acrylic/silica Organic-Inorganic Hybrid for Negative Resists

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Material Type: 記事
Title: Development of Photocuring Acrylic/silica Organic-Inorganic Hybrid for Negative Resists
Author/Editor: Kimihiro Matsukawa
Yukihito Matsuura
Hiroshi Inoue 他
Author Heading: Kimihiro Matsukawa
Yukihito Matsuura
Hiroshi Inoue
Periodical title: Journal of photopolymer science and technology
No. or year of volume/issue: 14(2) 2001
Volume: 14
Issue: 2
Pages: 181～184
Publication date of volume/issue (W3CDTF): 2001
ISSN (Periodical Title): 0914-9244
ISSN-L (Periodical Title): 0914-9244
Publication (Periodical Title): Chiba : The Society of Photopolymer Science and Technology
Place of Publication (Country Code): JP
Text Language Code: eng
Subject Heading: dipentaerythritol penta/hexa-acrylate
tetraethoxysilane
benzoin sulfonate
negative resist
NDLC: ZP48
Target Audience: 一般
Holding library: 国立国会図書館
Call No.: Z53-W515
Data Provider (Database): 国立国会図書館 : 国立国会図書館雑誌記事索引
https://ndlsearch.ndl.go.jp
Bibliographic ID (NDL): 5833263
http://id.ndl.go.jp/bib/5833263
Bibliographic Record Category (NDL): 632