Measurement of Plasma Density for Control of Etching Profile in Inductively Coupled Plasma Etching of InP. 41 5A

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Measurement of Plasma Density for Control of Etching Profile in Inductively Coupled Plasma Etching of InP.

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Summary, etc.：: We investigated the effect of the plasma density on the control of the etching profile in an inductively coupled plasma (ICP) etching of InP. It was f...

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Material Type: 記事
Title: Measurement of Plasma Density for Control of Etching Profile in Inductively Coupled Plasma Etching of InP.
Volume: 41
5A
Author/Editor: Matsutani Akihiro
Ohtsuki Hideo
Koyama Fumio
Iga Kenichi
Author Heading: Matsutani Akihiro
Ohtsuki Hideo
Koyama Fumio
Iga Kenichi
Publication Date: 2002
Publication Date (W3CDTF): 2002
Periodical title: Japanese Journal of Applied Physics
No. or year of volume/issue: 41 5A
Volume: 41
Issue: 5A
Pages: 3147-3148
ISSN (Periodical Title): 0021-4922
1347-4065
Subject Heading: Cl<FONT SIZE="-1"><SUB>2</SUB></FONT>
InP
double probe
mass spectrometry
inductively coupled plasma (ICP)
dry etching
Target Audience: 一般
DOI: 10.1143/JJAP.41.3147
Access Restrictions: インターネット公開
Data Provider (Database): 科学技術振興機構 : J-STAGE
http://www.jstage.jst.go.jp