光またはプラズマ励起酸素原子による低温酸化と多結晶Si薄膜トランジスタへの応用(小特集最新の酸化膜作製技術とその応用)

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Material Type: 記事
Title: 光またはプラズマ励起酸素原子による低温酸化と多結晶Si薄膜トランジスタへの応用
Author/Editor: 中田行彦
東和文
岡本哲也他
Series Title: 小特集最新の酸化膜作製技術とその応用
Author Heading: 中田行彦
東和文
岡本哲也
Periodical title: 真空 = Journal of the Vacuum Society of Japan
No. or year of volume/issue: 47(5) 2004.5
Volume: 47
Issue: 5
Pages: 357～363
Publication date of volume/issue (W3CDTF): 2004-05
ISSN (Periodical Title): 0559-8516
ISSN-L (Periodical Title): 0559-8516
Publication (Periodical Title): 東京 : 日本真空協会
Place of Publication (Country Code): JP
Text Language Code: jpn
NDLC: ZN15
Target Audience: 一般
Holding library: 国立国会図書館
Call No.: Z16-474
Data Provider (Database): 国立国会図書館 : 国立国会図書館雑誌記事索引
https://ndlsearch.ndl.go.jp
Bibliographic ID (NDL): 6969143
http://id.ndl.go.jp/bib/6969143
Bibliographic Record Category (NDL): 632