文書・図像類

真空紫外光CVDによる次世代積層型システムLSI作製用要素プロセス技術の開発

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真空紫外光CVDによる次世代積層型システムLSI作製用要素プロセス技術の開発

Material type
文書・図像類
Author
亀山, 晃弘
Publisher
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Material Format
Digital
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  • University of Miyazaki Academic Repository

    Digital
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Digital

Material Type
文書・図像類
Author/Editor
亀山, 晃弘
Author Heading
亀山, 晃弘 カメヤマ, アキヒロ
Alternative Title
The development of the element process technology for the new type LSI of the product layer by VUV-CVD
Text Language Code
jpn
Target Audience
一般
Note (General)
平成15年―平成17年度科学研究費補助金(基盤(B))研究成果報告書
Format (IMT)
application/pdf