InX(X=Cl, Br) 薄膜の分光学的キャラクタリゼーション

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Note (General)：: InX (X=Cl, Br) can be made amorphous by quench deposition of thin films. The amorphous films have well defined, characteristic crystallization temper...

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Material Type: 文書・図像類
Title: InX(X=Cl, Br) 薄膜の分光学的キャラクタリゼーション
Author/Editor: 角地, 貢
斎藤, 忠昭
近藤, 新一
Author Heading: 角地, 貢
斎藤, 忠昭
近藤, 新一
Publication Date: 2001-03
Publication Date (W3CDTF): 2001-03
Alternative Title: Spectroscopic characterization of InX 8X=Cl, Br) thin films
Periodical title: 遠赤外領域開発研究
No. or year of volume/issue: 2
Volume: 2
Pages: 149-155
Text Language Code: jpn
Target Audience: 一般
Note (General): InX (X=Cl, Br) can be made amorphous by quench deposition of thin films. The amorphous films have well defined, characteristic crystallization temperature (125K for InCl and 124K for InBr) at which the corresponding optical absorption spectra drastically change their patterns. There is tendency for very thin (<10nm) films to crystallize at higher temperature with decreasing thickness due to enhanced surface effects. It is also found that very thin (<5nm) InCl films deposited onto KCL substrates at room temperature crystallize in a cubic structure when annealed at 290K for more than 24h.
Access Restrictions: 限定公開
Data Provider (Database): 国立情報学研究所 : 学術機関リポジトリデータベース（IRDB）（機関リポジトリ）
https://irdb.nii.ac.jp
Original Data Provider (Database): 福井大学 : 福井大学学術機関リポジトリ