微細化技術に起因するシリコンデバイス特性劣化の発生機構の検討とその改善
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Bibliographic Record
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- Material Type
- 博士論文
- Author/Editor
- 倉知 郁生
- Author Heading
- 倉知 郁生 クラチ イクオ
- Degree grantor/type
- 東京理科大学
- Date Granted
- 2016-03-18
- Dissertation Number
- 乙第1083号
- Degree Type
- 博士(工学)
- Text Language Code
- jpn
- Target Audience
- 一般